Peabody, Mass., October 15, 2008 – Two of JEOL’s top-of-the-line cryo-electron microscopes will be key instrumentation for multi-disciplinary scientific advances in a new $1 billion research center in Kannapolis, North Carolina. The David H. Murdock Research Institute (DHMRI) has selected JEOL’s high resolution electron microscopes for its world-class laboratory, which will serve as a central... Read more
July 30, 2008 (Peabody, Mass.) — From the exhibition hall at the 2008 Microscopy and Microanalysis Conference in Albuquerque, New Mexico, JEOL USA will demonstrate – via remote operation – three of its more than 30 JEOL TEMs currently using Sirius™ Remote TEM software and internet or wireless connections. Visitors to the booth will be... Read more
July 31, 2008 (Peabody, Mass.) — JEOL USA will demonstrate a new high throughput Thermal Field Emission (FEG) Scanning Electron Microscope (SEM), the JSM-7600F, at M&M 2008 in Albuquerque, New Mexico in its booth #1027. Featuring the highest beam current available on any FEG SEM, the JSM-7600F integrates a semi-in-lens objective lens with an in-lens... Read more
July 30, 2008 (Peabody, Mass.) — JEOL USA will demonstrate both of its new MultiBeam SEM/FIB instruments in a special exhibit area dedicated to its ion beam “power tools” at M&M 2008. The LaB6 model, the JIB-4500 MultiBeam, was introduced in December 2007 and has already gained wide acceptance, with recent installations at nanotechnology research... Read more
July 28, 2008 (Peabody, Mass.) — JEOL USA will host a tutorial session at M&M 2008 in conjunction with Oak Ridge National Laboratory (ORNL) and Protochips to introduce PRISM – Practical Remote In Situ Microscopy. The PRISM tutorial will be held on Monday, August 4, 2008 at the Microscopy & Microanalysis (M&M) Exhibit in Albuquerque,... Read more
July 28, 2008 (Peabody, MA) — JEOL, the global leader in electron microscopy for nearly 60 years, will demonstrate a variety of new software packages for its 120kV to 300kV series of Transmission Electron Microscopes (TEMs) in booth #1027 at the M&M 2008 Microscopy and Microanalysis exhibit in Albuquerque, New Mexico from August 4-7. Exploring... Read more
Quantitative measurement method based on FRAP and FRAPa using multiphoton microscopy. We present a new convenient method for quantitative three-dimensionally resolved diffusion measurements based on the photobleaching (FRAP) or photoactivation (FRAPa) of a disk-shaped area by the scanning laser beam of a multiphoton microscope. Contrary to previously reported spot-photobleaching protocols, this method has the advantage... Read more
March 3, 2008 (Pittcon 2008, New Orleans, LA) — Two of the world’s leading imaging equipment suppliers – Nikon Instruments and JEOL – have joined forces to bring a new benchtop SEM to the market. The two companies will jointly introduce the NeoScope at Pittcon 2008, March 3-6, in New Orleans, Louisiana. “The NeoScope partnership... Read more
January 7, 2008 (Peabody, Mass.) — JEOL USA introduces a new mobile Scanning Electron Microscope that can travel or easily be moved to different locations as needed. The new CarryScope is the ideal instrument for the mobile crime lab where imaging and analysis of trace evidence are conducted right at the crime scene. In the... Read more
November 27, 2007, Peabody, Mass. — JEOL USA introduces a new high throughput SEM/FIB that combines Focused Ion Beam micro milling with the high resolution imaging of the JEOL LaB6 electron column. The MultiBeam is a high-productivity tool for IC defect analysis, circuit modification, TEM thin film sample preparation, and mask repair. A versatile all-in-one... Read more