Peabody, Mass., May 19, 2006 — JEOL, the leading manufacturer of e-beam lithography tools since 1967, announces the introduction of a new high precision direct write e-beam lithography system. The new JBX-6300FS is a spot beam, vector scan, step and repeat lithography system designed for high volume direct patterning on wafers, and is capable of... Read more
Peabody, Mass., May 19, 2006 — JEOL, the industry-leading manufacturer of high resolution Scanning Electron Microscopes (SEMs), will showcase its automated, 360 degree wafer edge review SEM in Booth 1101 in the South Hall at Semicon West 2006, Moscone Center, San Francisco. The JEOL JWS-2000 (200mm) and JWS-3000 (200/300mm) are the only wafer edge review... Read more
Peabody, Mass., May 17, 2006 — JEOL USA, a leading manufacturer of electron microscopes and analytical instruments, introduces a new ultra-high resolution Field Emission Scanning Electron Microscope (SEM) with advanced optics that clearly reveal intricate surface details during observation of nano structures of medical, biological, materials science, and semiconductor samples. Unique in-lens performance with semi-in... Read more
Peabody, Mass., April 17, 2006 — JEOL USA recently demonstrated a revolutionary remote capability for operating a transmission electron microscope (TEM) using a laptop computer with a cellular network connection. While seated at a picnic table 300 miles away, JEOL applications specialists manned the controls of a JEM-2200FS TEM operated at Lehigh University in Pennsylvania.... Read more
Peabody, Mass., March 17, 2006 — A new applications notebook from JEOL USA comprises more than 25 recent applications notes resulting from analyses using the AccuTOF™ DART™ (Direct Analysis in Real Time) mass spectrometer. The broad range of applications in this second volume of notes published since the introduction of DART includes pharmaceuticals, foods, industrial... Read more