Inspect 6″ wafers fast with 30% more field of view
DM3 XL Inspection System for Microelectronics and Semiconductor Inspection, process control or defect and failure analysis in the microelectronics and semiconductor industry must be fast and accurate. That’s why Leica Microsystems has developed the highly efficient DM3 XL inspection system for routine applications. The DM3 XL inspection system offers a unique macro objective with a... Read more