November 27, 2007, Peabody, Mass. — JEOL USA introduces a new high throughput SEM/FIB that combines Focused Ion Beam micro milling with the high resolution imaging of the JEOL LaB6 electron column. The MultiBeam is a high-productivity tool for IC defect analysis, circuit modification, TEM thin film sample preparation, and mask repair. A versatile all-in-one... Read more
November 5, 2007 (Peabody, Mass.) — JEOL USA announced today that the University of Southern California (USC) has purchased six electron microscopes, including a newly introduced SEM-FIB (a dual column focused ion beam system) for the university’s Center for Nano-Imaging in Los Angeles, California. USC is the first U.S. customer to purchase the new JEOL... Read more
One of the world’s leading electron microscopes at Oak Ridge National Laboratory, the JEOL 2200FS Aberration Corrected Electron Microscope (ACEM), is controlled and manipulated from London via the Lambda Rail. https://www.jeolusa.com/NEWS-EVENTS/Press-Releases/PostId/85/Cross-Atlantic-Operation-of-JEOL-2200FS-Aberration-Corrected-Electron-Microscope Read more
The recent acquisition of Jeol’s latest 300 kV field emission Transmission Electron Microscope (TEM), the JEM-3200FS, by Indiana University in the US for studying viruses is symptomatic of the ever increasing need for structural information about viruses to aid in the drug discovery process. https://www.jeolusa.com/NEWS-EVENTS/Press-Releases/PostId/84/JEOL-Puts-Viruses-Under-the-Microscope- Read more
October 2, 2007 (Peabody, Mass.) — Get the latest in mass spectrometry applications and news from JEOL USA through its new online newsletter, Mass Media. Launched to meet the needs of the growing JEOL community of mass spec users, the newsletter includes links to newly-published papers by renowned scientists using JEOL mass spectrometers, new applications... Read more
August 23, 2007 (Peabody, Mass.) — JEOL USA received a distinguished visitor at its Peabody, Massachusetts office on Tuesday, August 21st, when the 2007 Ernst Ruska Prize winner, Professor Hiroshi Jinnai of Kyoto Institute of Technology, visited JEOL’s U.S. headquarters. Dr. Jinnai, an invited speaker at the American Chemical Society Fall conference held in Boston... Read more
August 7 , 2007 (Peabody, Mass.) — JEOL USA will introduce and demonstrate a new compact, high-performance, 400MHz NMR spectrometer at ACS Fall 2007, August 20-22, in booth #919-921. The company will unveil the recently announced ECS-400 Nuclear Magnetic Resonance Spectrometer, featuring the new Jastec 400 MHz Super Self-Shielded superconducting magnet. The new, fully-digital ECS-400... Read more
August 2, 2007 (Peabody, Mass.) — JEOL USA, a leading supplier of electron microscopes and scientific instruments for nanotechnology, announced today that it has completed installation and acceptance of its first thermal field emission electron microprobe in the United States. The microprobe was installed at NIST in Gaithersburg, Maryland, in one of the world’s most... Read more
July 10, 2007 (Peabody, Mass.) — JEOL USA has introduced a new high resolution direct write e-beam lithography system to complement its family of spot beam, vector scan systems and mask production tools. The new JBX-5500FS direct write lithography tool writes patterns at a minimum line width of 10nm at 50kV on up to 100mm... Read more
JEOL USA (Peabody, Mass.) today announced a direct-write e-beam lithography system targeted at research labs and universities. The JBX-5500FS system is capable of 10 nm resolution at 50 kV on silicon pieces or wafers up to 100 mm. https://www.jeolusa.com/NEWS-EVENTS/Press-Releases/PostId/81/JEOL-Aims-Direct-Write-E-Beam-System-at-Academics Read more