New JEOL 120kV Transmission Electron Microscope for High Contrast, CryoTEM, and S/TEM Applications

November 9, 2006 (Peabody, Mass.) — JEOL USA introduces the latest in imaging technology and microscopy automation with its new 120 kV high resolution Transmission Electron Microscope (TEM). This versatile instrument, the model JEM-1400, is optimized for biological, polymer, and materials research, combining both imaging and cryomicroscopy excellence. High contrast resolution is assured at 0.38nm... Read more

High Throughput Screening of Counterfeit Drugs Described in New Paper on Novel Mass Spectrometry Techniques

August 9, 2006, Peabody, Mass. — A new technical paper describes the use of direct analysis in real time (AccuTOF-DART™) mass spectrometry for rapid screening and analysis of counterfeit drugs. In order to chemically fingerprint counterfeit anti-malarial drugs, Prof. Facundo Fernandez’ bioanalytical chemistry lab at Georgia Tech conducts experiments using novel mass spectrometry techniques. A... Read more

New Paper Describes Direct Analysis of Writing Inks Using DART™ Mass Spectrometry

August 7, 2006, Peabody, Mass. — A new technical paper describes the use of direct analysis in real time (AccuTOF-DART™) mass spectrometry for writing ink analysis performed for forensic applications. Analysis of writing inks to authenticate documents is described in the Journal of Forensic Science, July 2006, Vol. 51, No. 4, pages 915-918 in “Differentiating... Read more

New Electron Microscopy Lab Opens with Latest Cryo Technology from JEOL

Peabody, Mass., July 25, 2006 — JEOL USA, the industry-leading supplier of electron microscopes, has installed a model JEM-2100 LaB6 Transmission Electron Microscope (TEM) at Oklahoma State University’s new microscopy service laboratory. The lab, which will serve researchers from both the university and neighboring industry, hosted an open house to introduce their expanded facilities and... Read more

JEOL Introduces New High Resolution Direct Write System

Peabody, Mass., May 19, 2006 — JEOL, the leading manufacturer of e-beam lithography tools since 1967, announces the introduction of a new high precision direct write e-beam lithography system. The new JBX-6300FS is a spot beam, vector scan, step and repeat lithography system designed for high volume direct patterning on wafers, and is capable of... Read more

New Direct Analysis Mass Spec Applications Notebook (Volume 2)

Peabody, Mass., March 17, 2006 — A new applications notebook from JEOL USA comprises more than 25 recent applications notes resulting from analyses using the AccuTOF™ DART™ (Direct Analysis in Real Time) mass spectrometer. The broad range of applications in this second volume of notes published since the introduction of DART includes pharmaceuticals, foods, industrial... Read more

New Single-Beam FIB Offers Unique Cost Performance

Peabody, Mass., March 9, 2006 — A new single-column focused ion beam (FIB) system from JEOL makes automated, high-speed specimen preparation affordable at nearly one-third the cost of dual beam FIBs. The JEOL JEM-9320 FIB prepares thin films and cross sections for failure and defect analysis at the nanoscale using S/TEM, TEM or surface observation.... Read more

JEOL Introduces New Series of Scanning Electron Microscopes

Peabody, Mass., February 14, 2006 – JEOL USA, a leading supplier of scientific and analytical instruments, has introduced a new series of high resolution tungsten scanning electron microscopes (SEMs) featuring multiple live image displays, streamlined graphical interface, and improved low kV operation. The new SEM series enables simultaneous observation of up to three different images... Read more