Direct Write E-Beam Tool Extends JEOL’s Lithography Line
July 10, 2007 (Peabody, Mass.) — JEOL USA has introduced a new high resolution direct write e-beam lithography system to complement its family of spot beam, vector scan systems and mask production tools. The new JBX-5500FS direct write lithography tool writes patterns at a minimum line width of 10nm at 50kV on up to 100mm... Read more