JEOL to Remotely Demonstrate New High Throughput, Ultrahigh Resolution Analytical FE SEM at Semicon West 2009
June 30, 2009 (Peabody, Mass.) — JEOL, a leading supplier of electron microscopes for ultrahigh resolution imaging and analysis, will demonstrate its new ultrahigh resolution, analytical Thermal Field Emission Scanning Electron Microscope (SEM), the JSM-7600F, via live remote viewing and control from Semicon West, San Francisco, July 14-16. The SEM will be remotely operated from JEOL’s booth #606 to demonstrate ultrahigh imaging resolution at up to 1,000,000X magnification, and X-ray analytical mapping of individual layers, elemental composition, contaminants, particulates, and process defects in semiconductor devices.
The only fully-analytical field emission SEM to feature a large chamber with large specimen exchange airlock and LN2 anti-contaminator, the JSM-7600F accommodates specimens up to 200mm in diameter, and features a highly stable 5-axis motor drive eucentric stage that can be tilted from -5 to 70o.
The microscope’s electron column produces the highest beam current available on any FEG SEM, and provides superior imaging of nonconductive samples that traditionally charge. The JSM-7600F minimizes beam damage on heat sensitive samples, i.e. low-K dielectrics, and offers improved stability for unattended data acquisition, particle analysis, EBSD, and X-ray mapping.
The JEOL JSM-7600F is fully outfitted for comprehensive analysis techniques and can simultaneously view and acquire images and data from four different types of imaging detectors. The SEM also does double duty as a direct write e-beam lithography tool when outfitted with a high speed beam blanker and a pattern generator.
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