July 30, 2008 (Peabody, Mass.) — JEOL USA will demonstrate both of its new MultiBeam SEM/FIB instruments in a special exhibit area dedicated to its ion beam “power tools” at M&M 2008. The LaB6 model, the JIB-4500 MultiBeam, was introduced in December 2007 and has already gained wide acceptance, with recent installations at nanotechnology research centers at Boston College and the University of Southern California.
A new Field Emission MultiBeam, the model JIB-4600F, will debut at M&M 2008 in the JEOL booth #515. Customers will be able to see samples run on both models as well as on the argon ion beam Cross Section Polisher.
The JIB-4600F MultiBeam from JEOL is a powerful milling/imaging system with an in-lens thermal field emission gun for high resolution and highly stable probe current. Data mapping is rapidly achieved with a maximum current of 200nA. A field proven ion optics column features a large current mode of 30nA providing high FIB throughput. The ability to simultaneously view the FIB milling process with SEM imaging in real time is ideal for inner structure analysis and TEM thin film sample preparation.
The JIB-4600F large sample stage accommodates samples up to 50mm in diameter. A multiple port design accommodates several detectors including EDS, EBSD, and CLD, which are effective for analysis of sample surfaces and cross sections across a wide range of analytical needs. Samples are loaded through a standard airlock system.
https://www.jeolusa.com/NEWS-EVENTS/Press-Releases/PostId/75/JEOL-Adds-New-FE-MultiBeam-to-Its-SEMFIB-Lineup