July 11, 2007 Acad, Gov/Utilities Microscopy

JEOL Aims Direct-Write E-Beam System at Academics

JEOL USA (Peabody, Mass.) today announced a direct-write e-beam lithography system targeted at research labs and universities. The JBX-5500FS system is capable of 10 nm resolution at 50 kV on silicon pieces or wafers up to 100 mm. https://www.jeolusa.com/NEWS-EVENTS/Press-Releases/PostId/81/JEOL-Aims-Direct-Write-E-Beam-System-at-Academics Read more

April 10, 2007 Acad, Gov/Utilities M&A, Partnerships Microscopy

Indiana University Selects JEOL 300kV TEM for Virus and Nanotechnology Studies

April 10, 2007, Peabody, Mass. — The acquisition of a new 300 kV field emission Transmission Electron Microscope (TEM) from JEOL distinguishes Indiana University, Bloomington, Indiana as a major United States research facility where scientists can examine both biological and materials science structures at nanoscale resolution. Acquisition of the new JEOL TEM was completed in... Read more