January 15, 2007 (Peabody, Mass.) — JEOL USA announced today that Boston College has selected the new JEOL MultiBeam Focused Ion Beam system and a Field Emission Scanning Electron Microscope for its nanofabrication clean room facility in Newton, Massachusetts. As a result of Boston College’s continued investment in the sciences, the university opened its first... Read more
October 11, 2007 (Cambridge, Mass.) — Massachusetts Institute of Technology and the Consulate General of Japan in Boston hosted a seminar on Advanced Materials presented by Professor Akihisa Inoue, President of Tohoku University of Japan. Prof. Inoue addressed an audience of MIT materials science students and faculty, as well as representatives from JEOL USA who... Read more
JEOL USA (Peabody, Mass.) today announced a direct-write e-beam lithography system targeted at research labs and universities. The JBX-5500FS system is capable of 10 nm resolution at 50 kV on silicon pieces or wafers up to 100 mm. https://www.jeolusa.com/NEWS-EVENTS/Press-Releases/PostId/81/JEOL-Aims-Direct-Write-E-Beam-System-at-Academics Read more
April 10, 2007, Peabody, Mass. — The acquisition of a new 300 kV field emission Transmission Electron Microscope (TEM) from JEOL distinguishes Indiana University, Bloomington, Indiana as a major United States research facility where scientists can examine both biological and materials science structures at nanoscale resolution. Acquisition of the new JEOL TEM was completed in... Read more