July 10, 2007 (Peabody, Mass.) — JEOL USA has introduced a new high resolution direct write e-beam lithography system to complement its family of spot beam, vector scan systems and mask production tools.
The new JBX-5500FS direct write lithography tool writes patterns at a minimum line width of 10nm at 50kV on up to 100mm substrates. The PC-controlled operating platform features a simple graphical user interface (GUI) for pattern design and machine control.
Complete line of direct write and mask-making tools
“We are especially pleased to be able to offer this new lithography product during our fortieth anniversary since the introduction of the first JEOL e-beam system,” said Zane Marek, JEOL USA Semiconductor Equipment Product Manager.
“JEOL prides itself on having the widest range of tools in its e-beam family of both direct write and mask production systems. It’s also the one company that has consistently specialized in this niche for four decades,” he said.
Next-generation technology
JEOL’s product line and technical expertise covers all aspects of e-beam lithography, from 30kV SEM and EBL to 100kV production-level tools. The company introduced a next-generation direct write tool, the JBX-6300FS, for sub-ten nanometer linewidths at 100kV with sub 15nm stitching accuracy, in 2006.
The first U.S. installation of the JBX-6300FS was completed in June 2007 and the second will be completed in August. The JBX-6300FS is capable of writing minimum line widths of 8nm on 2-inch to 200mm wafers in either nano-lithography or high throughput mode. The JBX-9300FS, JEOL’s production level e-beam system, handles up to 300mm wafers.
Speaking of the new JBX-5500FS, Marek said, “The new direct write tool would be an ideal choice for research labs or universities. For the past several years, there has been a void between the two most common direct write tools – SEMs or Scanning Electron Microscopes with E-Beam attachments and dedicated E-Beam systems. The price gap between these levels has been too large to overcome, especially for universities.” The JBX-5500FS fills that void from a name that is synonymous with electron beam lithography.
JEOL wins two prestigious service awards in 2007
JEOL is committed to technical leadership and world class service and support. In 2007, the company received two prestigious awards with the highest scores for service in the company’s category of businesses with related markets.
“The skill and the understanding of this technology, the requirements in the industry, and the level of service and applications support set JEOL apart,” Marek said.
https://www.jeolusa.com/NEWS-EVENTS/Press-Releases/PostId/54/Direct-Write-E-Beam-Tool-Extends-JEOLs-Lithography-Line