JEOL USA (Peabody, Mass.) today announced a direct-write e-beam lithography system targeted at research labs and universities. The JBX-5500FS system is capable of 10 nm resolution at 50 kV on silicon pieces or wafers up to 100 mm.
https://www.jeolusa.com/NEWS-EVENTS/Press-Releases/PostId/81/JEOL-Aims-Direct-Write-E-Beam-System-at-Academics